Search Federallabs.org

This apparatus, developed at EL, determines gasification rate (mass loss rate) of a horizontally oriented specimen exposed in a nitrogen environment to a controlled radiant heat flux from a cone-shaped heater. These non-flaming conditions allow the condensed-phase gasification processes to be de-...

Description: CORAL Name: Sputter 2 Similar to the existing 4-Gun Denton Discovery 22 Sputter system, with the following enhancements: Specifications / Capabilities: Flex-type gun cathodes. This presents a 3rd axis of adjustment for uniformity tuning and angular plasma presentation. The heating...

Description: Located on the NIST Gaithersburg campus, the Robotics Test Facility - also known as Building 207 - is a laboratory for developing standard methods of measuring robot performance. The facility houses artifacts and equipment for measuring how well robots perform under a variety of tasks...

Description: CORAL Name: XeF2 Silicon Etcher This system uses Xenon difluoride vapor to etch silicon Specifications / Capabilities: Pieces up to 6" wafers Silicon substrates allowed All other materials must be approved Glass and Silicon Substrates allowed Scientific Opportunities / Applications:...

Description: CORAL Name: SussMA8 This system utilizes 1X contact lithography to transfer photomask patterns onto substrates Specifications / Capabilities: UV broadband (350 nm to 450 nm), I-line (365 nm) and G-line (436 nm) wavelength available. Contact super-user for installing I-line or G-line...

The NIST manufacturing robotics test bed consists of several labs located in three buildings on the main NIST campus. Combined, these serve as a resource for research in robotics for advanced manufacturing and material handling. The test bed contains representative state-of-the-art manufacturing...

The JEOL JXA-8600 is a conventional hairpin filament thermal emission electron microprobe that is more than 20 years old. It is capable of performing qualitative and quantitative X-ray microanalysis and secondary, backscattered, and topographic electron imaging on a wide variety of samples. It...

Radioactivity measurements for diagnostic and therapeutic nuclear medicine in the United States are based on measurements at NIST. Activity measurements for the gamma-ray-emitting radionuclides are made using 4πβ liquid scintillation spectrometry and 4πγ ionization chamber. The calibration process...

The spectral irradiances of deuterium lamps from 200 nm to 400 nm are calibrated in the Facility for Irradiance Calibration Using Synchrotrons (FICUS) which is located in the Synchrotron Ultraviolet Radiation Facility III (SURF III). Specifications / Capabilities: A single-grating monochromator...

FASCAL 2 facility is solely dedicated to spectral irradiance scale realizations and calibrations. The spectral irradiance standards are calibrated using a high-temperature blackbody operating at nearly 3000 K. The temperature of the blackbody is determined using detector-based techniques traceable...

The FASCAL has been in continuous operations since 1970s for the calibrations of spectral radiance of sources. The measurements are performed by the use of a prism-grating double monochromator whose spectral radiance responsivity is determined using a variable-temperature blackbody. The temperature...

The FUV Calibration Facility is used for detector-based radiometry and other measurements of optical properties in the far ultraviolet (FUV) from 50 nm to 254 nm wavelength (5 eV to 25 eV photon energy). The light source is a duoplasmatron - a hot-filament discharge confined in a magnetic field -...

Description: CORAL Names: SiN LPCVD, Poly LPCVD, LTO LPCVD This three stack furnace system is utilized to deposit silicon nitride, polysilicon, and low temperature oxide (LTO) Specifications / Capabilities: 3", 4", and 6" wafers No photoresist or plastic substrates Scientific Opportunities /...

Description: CORAL Name: Unaxis RIE 1 A system based on Argon and Fluorine gases to etch metal and dielectric materials on planar substrates up to 200 mm in diameter. Specifications / Capabilities: RF: 13.56 MHz Power: 500w Gases: Ar, CHF 3, CF 4, SF 6, O 2 Scientific Opportunities / Applications:...

Description: Needs Description. Scientific Opportunities / Applications: Measures thickness of fils such as silicon dioxide, photoresist and nitride

Description: The fire emulator/detector evaluator (FE/DE) is a computer-controlled flow tunnel used to re-create the environments surrounding detectors in the early stages of fire and background environments that give rise to false alarms. The flow velocity, temperature, humidity, carbon monoxide,...

The Synchrotron Ultraviolet Radiation Facility SURF III is operated by the National Institute of Standards and Technology NIST as a stable light source for radiometry and research. SURF covers the wavelength range from the far infrared to the soft x-ray. Different measurements and services are...

Description: HMDS (hexamethyldisilzane) promotes photoresist adhesion by creating a bond between the resist and silicon. The silizanes bond to the silicon in the wafer while the methyls bond with the photoresist. Vapor priming allows for HMDS application in a monolayer and reduces the chance of...

The Virtual Factory Testbed (VFT) is comprised of three physical facilities linked by a standalone network (VFNet). The three facilities are the Smart and Wireless Systems (SAWS) laboratory, the Metrology Interoperability Testbed (MIT), and the Controls Laboratory. The purpose of the VFT is to link...

In order to support the development of test methods and reference materials for volatile organic compounds (VOC) emissions from building materials and furnishings, EL maintains a number of environmental chambers for measuring these emissions. Specifications / Capabilities: Three different types of...

Description: CORAL Name: AFM 1 A tool used to characterize the material surface, nanostructures generated by nanofabrication, nanomanipulation, and nanolithography. The tool can take samples up to 200mm in diameter and 12mm in thickness. Specifications / Capabilities: Contact mode, Tapping mode TM...

Description: CORAL Names: CMOS Wet Ox, CMOS Dry Ox, Boron Doping (P-type), Phos. Doping (N-Type) This four-stack furnace bank is used for the thermal growth of silicon dioxide and diffusion by solid source. Specifications / Capabilities: Silicon Dioxide Growth Wet Oxide (Tube 1)-typically used for...

Radiance Temperature Calibration Laboratory is used for the calibration of radiation thermometers, tungsten-strip lamps and heat flux gauges. Specifications / Capabilities: A radiation thermometer centered at 655.3 nm is calibrated using the detector-based temperature of a gold freezing temperature...

Specular gloss is the perception by an observer of the mirror-like appearance of a surface. The measurement of specular gloss consists of comparing the luminous reflectance from a test sample to that from a calibrated gloss standard, under the same experimental conditions. Therefore, gloss is a...

The NIST gonio-spectroradiometer is used to measure total spectral radiant flux (TSRF) of incandescent lamps. The instrument consists of a 3-axis scanning mechanism; an array spectroradiometer equipped with a fast, cooled (-10 oC) charged-coupled device (CCD), and a computer system that controls...

In 1993, the United States Congress directed the U.S. Department of Transportation to establish "a standard for a minimum level of retroreflectivity that must be maintained for pavement markings and signs which apply to all roads open to public travel." The establishment of a national standard for...

Visible to near-infrared spectral comparator facility (Vis/NIR SCF) The Vis/NIR SCF is a monochromator-based system that typically measures the spectral power responsivity of photodiodes in the spectral region of 350 nm to 1800 nm. The Vis/NIR SCF operates from 350 nm to 1100 nm using silicon...

Solid-state lighting (SSL) is increasingly being introduced into the market and it is expected that many of the light sources currently used for general illumination will be replaced by light-emitting diodes (LEDs) in the future. As the spectra of LED sources are dissimilar to traditional...

The Fourier transform infrared spectrophotometry (FTIS) facility serves as the measurement facility for characterizing the optical properties of materials in the infrared spectral range of 1 µm to 100 µm, with particular emphasis on the 2 µm to 20 µm region. The facility is built around several...

The Low background infrared (LBIR) facility was originally designed to calibrate user supplied blackbody sources and to characterize low-background IR detectors and attenuators. Today, the facility continues to operate in this capacity providing calibrations of cryogenic blackbodies and transfer...