Available Technology

A method for fabricating compact alkali vapor cells with an on-wafer alkali source

The invention is a method for fabricating millimeter-scale and sub-millimeter calls containing a vapor of alkali atoms in large numbers at the wafer scale. The key element of the method is that the wafer that forms the glass lid of the cell is translated laterally between the alkali deposition step and the final bonding step. This translation step allows the source of alkali atoms to be integrated as part of one of the wafers and hence removes the need to have a separate alkali atom source, which can be complicated to implement

Abstract: 

The invention is a method for fabricating millimeter-scale and sub-millimeter calls containing a vapor of alkali atoms in large numbers at the wafer scale. The key element of the method is that the wafer that forms the glass lid of the cell is translated laterally between the alkali deposition step and the final bonding step. This translation step allows the source of alkali atoms to be integrated as part of one of the wafers and hence removes the need to have a separate alkali atom source, which can be complicated to implement

Inventors: 

John Kitching

Technology Type(s): 
Alkali vapor cell
Internal Laboratory Ref #: 
18-054
Patent Status: 
Pending application 16/357650
Phone: 
301-975-2573
Email: 
tpo@nist.gov
Lab Representatives
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