Available Technology

APPARATUS AND METHOD FOR ENHANCING THE ELECTROMAGNETIC SIGNAL OF A SAMPLE

Through modeling study we first noticed that the sensitivity of ellipsometry measurement of polymer thin films reached a maximum at certain film thickness; later on we realized that this high sensitivity could also be achieved when part of the polymer film thickness was substituted with a silicon oxide layer. The subsequent theoretical and modeling study demonstrated that this oxide layer, i.e. the auxiliary layer, assisting layer or sensitivity enhancement layer, needed to be at a specific thickness in order to maximize the sensitivity over a given spectral bandwidth. We have purchased and made a series silicon wafers with auxiliary oxide layer at certain designed thicknesses and the abovementioned notion was successfully validated. In addition, we noticed that liquid cell based on reverse incidence spectroscopic ellipsometry will also benefit from this discovery. This technique can bring a significant improvement in the measurement accuracy and precision in spectroscopic ellipsometry and reflective spectroscopy through a spectral region from IR to Vis and UV. 
Inventors: 
Wen Li Wu, Shuhui Kang
Patent Number: 
8,436,996
Internal Laboratory Ref #: 
09-013
Lab Representatives
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