Available Technology

Sub-Pixel Spatial Resolution Interferometry With Interlaced Stitching

Patent Abstract: 
Innovators at NASA's Marshall Space Flight Center have developed a method to increase the spatial resolution of interferometric measurements of optical surfaces beyond the fundamental Nyquist Limit of the interferometers' imaging system/detector. This method will enable optical fabricators to accurately qualify surface features of spatial frequencies that could not be accurately resolved using standard interferometers. This method involves implementing "super-resolution" techniques by performing multiple measurements of the optic under test with sub-pixel shifts in the detector. The measurements are "stitched" together to create a measurement with a higher spatial resolution than the individual measurements.
Benefits: 
applications: 
Patent Number: 
8,169,620
Internal Laboratory Ref #: 
MSFC-QL-0045
Patent Status: 
2030-10-15
Patent Issue Date: 
January 1, 1970
Agency
NASA
Region
Southeast
State: 
Alabama
Phone: 
256-544-9151
Email: 
terry.taylor@nasa.gov
Lab Representatives
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